Talk:Photoresist

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[edit] What about e-beam?

I don't know much about resists but it seems like a mention of resist for e-beam lithography is in order, and perhaps a few words about resists for soft lithography like PDMS. Maybe a table would be a good way to summarize this kind of material? Alison Chaiken 06:04, 28 January 2006 (UTC)

Sounds like a natural idea to include e-beam. Other articles have referred to photoresists in electron beam lithography? 61.62.56.136 03:39, 29 January 2006 (UTC)

Huh, I just noticed that not only is there an electron beam lithography article, there's a long one called resist that this article should be merged with. Assuredly photoresist is a better article title. Alison Chaiken 03:56, 29 January 2006 (UTC)

Yes, it looks like the resist and photoresist articles can be merged. Some organization will be necessary afterwards. The resist article focuses more on applications, the photoresist article focuses more on how photoresists work.Guiding light 04:20, 29 January 2006 (UTC)

I put the previous contribution by Chemprof on low energy electron interactions in the section on electron exposure. 61.61.254.9 02:42, 16 May 2006 (UTC)

Hi, I manage a cleanroom and use both photo and e-beam resists. Photo resists are a subject unto themselves, they cover a huge range of process parameters, and resist behaviors. E-beam resists by comparrison are a very small subject. Since you are getting picky don't forget X-Ray resists and nano imprinting "resists" Brig Young <@uidaho.edu> 12:00, 17 May 2006 (PDT)

Hi, can you specify more clearly how photoresists are distinguished from electron beam resists? Usually the photoresists are chemically more complicated and sensitive, so we can have simpler procedures for the ebeam resists like PMMA or ZEP.211.72.108.18 14:34, 18 May 2006 (UTC)

Quite simply, the substances that react to light are not the same substances that react to electrons. The article needs to make this clear. --Smack (talk) 22:20, 2 January 2007 (UTC)

It's true, electron-beam resists do not need to be photoresists, even though photoresists have some response to electrons (though not necessarily ideal). The photoresist must have a component that is sensitive to a particular wavelength, but the electron-beam resist does not need it. For electron beam resists, the polymer chain molecular weight is more critical.Guiding light 05:03, 10 January 2007 (UTC)