Image:Ion implanter schematic.png
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Ion_implanter_schematic.png (500 × 486 pixel, file size: 32 KB, MIME type: image/png)
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Schematics of a mass separating implantation/deposition setup. Ions are accelerated with an applied high tension Uaccell, mass separated in a magnetic field, pass through an apperture and are decelerated with a high tension Udecell. Ion energy at the substrate is determined by the difference of Uaccell and Udecell. The deceleration step is optional (common in the case of deposition) and may be replaced by further acceleration steps to increase ion energy.
Image created by Daniel Schwen using Tgif.
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Schematics of an mass separating implantation/deposition setup. Ion energy at the substrate is determined by the difference of Uaccell and Udecell. Image created by User:Dschwen using Tgif.
