Talk:Sputtering
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—Maybe someone should put in a reactive sputtering section. I know a little, but I might take a while to get around to it.--Joel 19:13, 11 May 2005
I agree, there is a misleading statement that sputtering always produces thin films with the same composition as the source material. This is not the case as lighter elements may be lost through the "sputering gas" in the diagram, a particular example of this is sputtering of non stoichiometric silicon oxide SiOx, where you can use various silicon compounds and contol the amount of oxygen by controling the flow of oxygen through the sputtering chamber.
[edit] Illustrations?
This article could use some illustrations.
Sputtering is also a very precise deposition technique used to create strain gages for pressure switches. These pressure switches exhibit high stability, long life, high temperature operating range and high reliability primarily due to the very good adhesion characteristics of the target material on the substrate as a result of this technique.
Deposition thickness can be very precisely controlled and are more uniform than other deposition techniques.
203.126.19.131Robert Brady (Regional Manager AMETEK Aerospace and Defense)203.126.19.131
- But that would be Sputter deposition. If you feel you can enhance the appropriate section, be bold. --Dschwen 09:17, 12 November 2005 (UTC)
The article defines sputtering as ejection of atoms in the gas phase. In an experiment I'm working on sputtering also refers to ejection of electrons/ions in the vacuum. Is this just forgotten in the article?
[edit] Sputtering, not evaporation
This
"Aluminized Mylar as used in packaging is deposited by means of thermal evaporation in a roll-to-roll web process."
is interesting but belongs in an article about evaporation, not about sputtering.
There's a nice magnetron article. The sputtering article should link to it.
Alison Chaiken 03:56, 9 October 2005 (UTC)
[edit] My amendment to sputtering article
Hello,
I'm new to Wikipedia and have had great help from user A.B. who has helped me get used to the etiquette of Wikipedia and has advised me to talk to you involved in this particular subject. I am part of a team at the forefront of the sputtering process I have added to this article (HiTUS) and will be adding content to other similar areas in due course. I look forward to being of assistance in due course on this subject and other topics closely linked to sputtering and thin film deposition.
Antony Addy
